Resumen
Variable-period scanning beam interference lithography (VP-SBIL) can be used to fabricate varied-line-spacing (VLS) plane gratings. The exposure phase modulation method to pattern a VLS grating with a desired groove density must be carefully devised. In this paper, a mathematical model of the total exposure dose for VLS plane grating fabrication is established. With model-based numerical calculations, the phase modulation effects of the parameters, including the fringe locked phase, fringe density, and step size, are analyzed. The parameter combinations for the phase modulation are compared and chosen, and the optimal coordinate for phase compensation is selected. The calculation results show that the theoretical errors of the groove density coefficients can be controlled within 1e-8. The mathematical model can represent the deposited exposure dose for patterning VLS gratings during the lithography process, and the chosen parameters and proposed phase modulation method are appropriate for patterning VLS gratings with VP-SBIL.