Inicio  /  JOURNAL OF TRIBOLOGY  /  Vol: 126 Núm: 1 (2004)  /  Artículo
ARTÍCULO
TITULO

Analysis of the Tribological Mechanisms Arising in the Chemical Mechanical Polishing of Copper-Film Wafers

Jen Fin Lin    
Junne Dar Chern    
Yang Hui Chang    
Ping Lin Kuo    
and Ming Shih Tsai    

Resumen

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