Inicio  /  SCRIPTA MATERIALIA  /  Vol: 60 Núm: 8 Par: 0 (2009)  /  Artículo
ARTÍCULO
TITULO

Size control of silicon nanocrystals in silicon nitride film deposited by catalytic chemical vapor deposition at a low temperature (200 °C)

Kyoung-Min Lee    
Tae-Hwan Kim    
Jae-Dam Hwang    
Seunghun Jang    
Kiyoung Jeong    
Moonsup Han    
Sunghwan Won    
Junghyun Sok    
Kyoungwan Park    
Wan-Shick Hong    

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