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TITULO

In Situ Plasma Monitoring of PECVD nc-Si:H Films and the Influence of Dilution Ratio on Structural Evolution

Yu-Lin Hsieh    
Li-Han Kau    
Hung-Jui Huang    
Chien-Chieh Lee    
Yiin-Kuen Fuh and Tomi T. Li    

Resumen

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