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M. I. Rodríguez-Tapiador, J. M. Asensi, M. Roldán, J. Merino, J. Bertomeu and S. Fernández
Copper nitride (Cu3N) has gained significant attention recently due to its potential in several scientific and technological applications. This study focuses on using Cu3N as a solar absorber in photovoltaic technology. Cu3N thin films were deposited on ...
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Xiaolei Ye, Huan Luo, Ming Hou, Pierre Bertrand, Alain Billard and Pascal Briois
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Soyoung Kim, Jung-Hwan In, Seon Hoon Kim, Karam Han, Dongkook Lim, Yun Sik Hwang, Kyung Min Lee and Ju Hyeon Choi
SiO2/Nb2O5 multilayer thin films were designed for the special application of an aviation lighting system emitting green light. For optical components in this system to meet requirements such as a high transmittance and durability, SiO2/Nb2O5 multilayer ...
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Kouamé Boko Joël-Igor N?Djoré, Moussa Grafouté, Younes Makoudi, Waël Hourani and Christophe Rousselot
Tungsten oxide films are deposited onto glass and silicon substrates using reactive magnetron sputtering. Several studies have revealed difficulties in studying the electrical properties of resistive WOx films. The main objective of this work is to propo...
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Samiran Bairagi, Kenneth Järrendahl, Fredrik Eriksson, Lars Hultman, Jens Birch and Ching-Lien Hsiao
Glancing angle deposition (GLAD) of AlN nanostructures was performed at room temperature by reactive magnetron sputtering in a mixed gas atmosphere of Ar and N2. The growth behavior of nanostructures shows strong dependence on the total working pressure ...
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Li-Chung Yang, Der-Ru Jung, Fang-Ru Po, Chia-His Hus and Jau-Shiung Fang
Bandgap enlarged Mg-doped aluminum zinc oxide (Mg-doped AZO) film is a potential transparent conducting oxide for applications in photonics devices. The oxide film normally deposited by sputtering, particularly using ceramic targets, while maintaining it...
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Chenkai Liu, Hongbo Ju, Lihua Yu, Junhua Xu, Yaoxiang Geng, Wenxiang He and Jixuan Jiao
Mo2N films were synthesized using the reactive magnetron sputtering system in a mixture of argon and nitrogen, and the tribological properties were investigated at different testing temperatures against an Al2O3 counterpart. The relative intensity ratio ...
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Grégory Abadias, Firat Angay, Rubenson Mareus and Cédric Mastail
In this study, polycrystalline hafnium nitride (HfN) thin films were grown by oblique angle deposition (OAD) technique to investigate the relationship between column tilt angle, texture development and residual stress evolution with varying inclination a...
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Masoud Mohammadtaheri, Qiaoqin Yang, Yuanshi Li and Jesus Corona-Gomez
Appropriate conditions for depositing hard Cr2O3 coatings by reactive sputtering techniques have yet to be defined. To fill this gap, the effect of principal deposition parameters, including deposition pressure, temperature, Cr-target voltage, and Ar/O2 ...
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Qingfu Wang, Liping Fang, Qinghe Liu, Lin Chen, Qinguo Wang, Xiandong Meng and Hong Xiao
Aluminum oxide thin films were prepared by medium frequency reactive magnetron sputtering. The target voltage hysteresis behavior under different argon partial pressure and target power conditions were studied. The results indicate that the target voltag...
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