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Hirokatsu Yumoto, Yuichi Inubushi, Taito Osaka, Ichiro Inoue, Takahisa Koyama, Kensuke Tono, Makina Yabashi and Haruhiko Ohashi
A nanofocusing optical system?referred to as 100 exa?for an X-ray free-electron laser (XFEL) was developed to generate an extremely high intensity of 100 EW/cm2 (1020 W/cm2) using total reflection mirrors. The system is based on Kirkpatrick-Baez geometry...
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