REVISTA

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ISSN: 2078-2489   Frecuencia: 4   Formato: Electrónica

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21 artículos asociados

Volumen 9 Número 0 Parte 2 Año 2018

David Muelas, Javier Ramos and Jorge E. López de Vergara
 

Katiuscia Mannaro, Gavina Baralla, Andrea Pinna and Simona Ibba
 

Eduardo Miravalls-Sierra, David Muelas, Jorge E. López de Vergara, Javier Ramos and Javier Aracil
 

Bin Wang, Lin Chen, Weimin Li and Jinfang Sheng
 

Heri Prasetyo and Hendra Kurniawan
 

Lijing Zhu, Peize Wang and Sha Xi
 

Hui Jiang, Jianping Wang, Yu Han and Huiguang Yin
 

Shuangshuang Chen, Huiyi Liu, Xiaoqin Zeng, Subin Qian, Wei Wei, Guomin Wu and Baobin Duan
 

Surapati Pramanik, Shyamal Dalapati, Shariful Alam, Florentin Smarandache and Tapan Kumar Roy
 

Zhikang Lu and Jun Ye
 

Hugo Gonçalo Oliveira
 

Hugo Gonçalo Oliveira
 

Leigang Dong, Guohua Liu, Xiaowei Cui and Tianyu Li
 

Shinichi Endo and Kaori Fujinami
 

James Birt, Zane Stromberga, Michael Cowling and Christian Moro
 

Vinícius Maran, Guilherme Medeiros Machado, Alencar Machado, Iara Augustin and José Palazzo M. de Oliveira
 

Michael Cowling and James Birt
 

Robert A. N. de Oliveira and Methanias C. Junior
 

Jose-Manuel Martinez-Caro, Antonio-Jose Aledo-Hernandez, Antonio Guillen-Perez, Ramon Sanchez-Iborra and Maria-Dolores Cano
 

Jie Li, Jianping Wang, Na Xu, Yunpeng Hu and Caiyun Cui
 

Yan Tang, Isaac Mackey and Jianwen Su