REVISTA

Applied Sciences

ISSN: 2076-3417    Frecuencia: 4   Formato: Electrónica

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30 artículos asociados

Volumen 8 Número 5 Parte May Año 2018

Ali Ghorbani, Hadi Hasanzadehshooiili and Lukasz Sadowski
 

Songtao Lv, Xiyan Fan, Chengdong Xia, Jianlong Zheng, Dong Chen and Lingyun You
 

Jianchao Wu, Changhang Xu, Baoxin Qi and Francisco C. Robles Hernandez
 

Jia-Hua Chen and Shu-Liang Zou
 

Wei Zhao, Yi Fu, Xiaosong Wei and Hai Wang
 

Yaohui Hu, Wuwei Kang, Yong Fang, Lingrui Xie, Longzhen Qiu and Tao Jin
 

Junde Wang, Songyang Lao, Shengjun Huang, Liang Bai and Lvlin Hou
 

Md Irfan Ansari, Ajay Kumar, Danuta Barnat-Hunek, Zbigniew Suchorab, Wojciech Andrzejuk and Dariusz Majerek
 

Jan Mrázek, Ivan Ka?ík, Lenka Procházková, Václav Cuba, Vladimír Girman, Viktor Puchý, Wilfried Blanc, Pavel Peterka, Jan Aubrecht, Jakub Cajzl and Ondrej Podrazký
 

Xiaojiao Xiao, Juanjuan Zhao, Yan Qiang, Hua Wang, Yingze Xiao, Xiaolong Zhang and Yudong Zhang
 

Linhui Qiang, Cong Zhang, Feng Qu, Xiaonan Wu and Hongyan Wang
 

Peter Wai Ming Tsang, Ting-Chung Poon and Jung-Ping Liu
 

Colin A. Scholes
 

Johannes Kiefer
 

Emrah Basaran, Muhittin Gökmen and Mustafa E. Kamasak
 

Tivadar Lohner, Benjamin Kalas, Peter Petrik, Zsolt Zolnai, Miklós Serényi and György Sáfrán
 

Mustafa Aydin, Ahmet Irgin and M. Bahattin Çelik
 

Yongqiang Liu, Shixi Yang and Xuekun Liu
 

Zengming Deng and Mingjiang Wang
 

Kai Liu, Jianwei Gong, Shuping Chen, Yu Zhang and Huiyan Chen
 

Nina Harting, René Schenkendorf, Nicolas Wolff and Ulrike Krewer
 

Haotian Guo, Xiao Liang, Zhenglei Yu, Tao Xu, Tianyi Zhang, Huan Liu and Long Ma
 

Héctor Migallón, Antonio Jimeno-Morenilla and Jose-Luis Sanchez-Romero
 

Sergey Yu. Karpov
 

Toshio Fukuda, Fei Chen and Qing Shi
 

Holger Billhardt, Alberto Fernández, Marin Lujak and Sascha Ossowski
 

Wei Feng, Wenjiang Huang and Jinchang Ren
 

Guoqing Geng, Zhen Wu, Haobin Jiang, Liqin Sun and Chen Duan
 

Yun Ren, Changren Zhu and Shunping Xiao
 

Hui Chen, Mathieu Denis, Pierre-Antoine Bouit, Yinlong Zhang, Xinda Wei, Denis Tondelier, Bernard Geffroy, Zheng Duan and Muriel Hissler