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Inicio  /  Applied Sciences  /  Vol: 9 Par: 15 (2019)  /  Artículo
ARTÍCULO
TITULO

Comparison of Various Factors Affected TID Tolerance in FinFET and Nanowire FET

Hyeonjae Won    
Ilsik Ham    
Youngseok Jeong and Myounggon Kang    

Resumen

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