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Xiaoyan Shi, Fuming Yang, Enzhu Hou and Zhongzhu Liang
Metalenses, with their unique modulation of light, are in great demand for many potential applications. As a proof-of-principle demonstration, we focus on designing SiO2 metalenses that operate in the deep ultraviolet region, specifically around 193 nm. ...
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Junbo Liu, Ji Zhou, Dajie Yu, Haifeng Sun, Song Hu and Jian Wang
As an effective resolution enhancement technology, source optimization (SO) is considered key for significantly improving the image quality of optical lithography at advanced nodes. To solve the problem of unsatisfactory SO performance, it is necessary t...
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Marco Pisco and Francesco Galeotti
The realization of advanced optical fiber probes demands the integration of materials and structures on optical fibers with micro- and nanoscale definition. Although researchers often choose complex nanofabrication tools to implement their designs, the m...
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Gianluca Ruffato, Michele Massari, Pietro Capaldo and Filippo Romanato
Generation and sorting of optical beams carrying orbital angular momentum of light for combined polarization- and mode-division multiplexing in the telecom infrared, either for free-space or multi-mode fiber transmission.
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Job Beckers, Tijn van de Ven, Ruud van der Horst, Dmitry Astakhov and Vadim Banine
This work finds application in Extreme Ultraviolet (EUV) lithography in general. More specifically, the results may impact the development of EUV optical components used in the related equipment.
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Pengzhi Wei, Yanqiu Li, Tie Li, Naiyuan Sheng, Enze Li and Yiyu Sun
The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process. Due to multi-factor impact, def...
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Shaobo Ge, Weiguo Liu, Shun Zhou, Shijie Li, Xueping Sun, Yuetian Huang, Pengfei Yang, Jin Zhang and Dabin Lin
A micro-pyramid structured thin film with a broad-band infrared antireflection property is designed and fabricated by using the single-point diamond turning (SPDT) technique and combined with nano-imprint lithography (NIL). A structure with dimensions of...
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He Lin, Mingzhao Ouyang, Bingxu Chen, Qifan Zhu, Jinshuang Wu, Nan Lou, Litong Dong, Zuobin Wang and Yuegang Fu
Reflection loss on the optical component surface is detrimental to performance. Several researchers have discovered that the eyes of moths are covered with micro- and nanostructured films that reduce broadband and wide-angle light reflection. This resear...
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Lucilene Dornelles Mello, Alexandre Kisner, Arnaldo Pereira, Lauro Tatsuo Kubota
Pág. 147 - 152
In this study, carbon-based electrodes for disposable use were constructed using the technique of optical lithography. The process consisted in the irradiation of UV light on a layer of photosensitive resin (SU-8 50) deposited on a substrate of PVC. The ...
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