REVISTA

Applied Sciences

ISSN: 2076-3417    Frecuencia: 4   Formato: Electrónica

Tablas de contenido  

30 artículos asociados

Volumen 7 Número 3 Parte March Año 2017

Zhijie Mai, Haitao Xu, Fang Lin, Yan Liu, Shenhe Fu and Yongyao Li
 

Ertugrul Cam, Goksu Gorel and Hayati Mamur
 

Junqiang Lou, Jiangjiang Liao, Yanding Wei, Yiling Yang and Guoping Li
 

Eric Rojas, Marcos Sepúlveda, Jorge Munoz-Gama, Daniel Capurro, Vicente Traver and Carlos Fernandez-Llatas
 

Norbert Herencsar, Jaroslav Koton and Pavel Hanak
 

Rong Zhu, Xinyu Wang, Jing Yang, Yiyu Wang, Zongrui Zhang, Yuanjing Hou, Fei Lin and Yi Li
 

Mulian Zheng, Peng Li, Jiangang Yang, Hongyin Li, Yangyang Qiu and Zhengliang Zhang
 

Feipeng Xiao, Ruoyu Li, Henglong Zhang and Serji Amirkhanian
 

Shu Han Hsu and Tetsushi Biwa
 

Daniel Woldemariam, Andrew Martin and Massimo Santarelli
 

Dongjiang Pan, Nong Zhang, Changliang Han, Sen Yang, Chenghao Zhang and Zhengzheng Xie
 

Teng Wang, Juequan Chen, Xiangdong Gao and Wei Li
 

Jianmei Wang, Ke Ning, Liang Tang, Reza Malekian, Yinan Liang and Zhixiong Li
 

Yanping Sheng, Haibin Li, Ping Guo, Guijuan Zhao, Huaxin Chen and Rui Xiong
 

Hong-Chao Zhuang, Hai-Bo Gao and Zong-Quan Deng
 

Marcin Noga
 

William Hanks, John T. Costello and Lampros A. A. Nikolopoulos
 

Agnieszka Woszuk and Wojciech Franus
 

Markus Armbruster, Mathias Mönckedieck, Regina Scherließ, Rolf Daniels and Martin A. Wahl
 

Tayser Sumer Gaaz, Abu Bakar Sulong, Abdul Amir H. Kadhum, Mohamed H. Nassir and Ahmed A. Al-Amiery
 

Shuaicheng Guo, Qingli Dai, Xiao Sun, Ye Sun and Zhen Liu
 

Hao Li, Xie-Fei Ding, Zheng-Nan Yin and Heng Xiao
 

Shin Yoshizawa, Ryo Takagi and Shin-ichiro Umemura
 

Mustafa E. Amiryar and Keith R. Pullen
 

De-Shin Liu and Yao-Te Chen
 

Christian Schnabel, Maria Gaertner and Edmund Koch
 

Mario Eck, Silvio Geist and Dieter Peitsch
 

Fangzong Wang, Mingshuai Pan and Yong Wang
 

Baojie Liu, Du Fu and Xianjun Yu
 

Gang Zhang, Jianglin Qian and Xinyu Zhang